7 May 2026
Oxford Instruments Partners with NYU Nanofab to Pioneer Atomic-Scale Quantum Advancements with PlasmaPro ASP
New York University's NYU Nanofabrication Cleanroom has enhanced its quantum fabrication capabilities by installing an Oxford Instruments PlasmaPro ASP atomic layer deposition (ALD) system, becoming the first in the United States to utilise this technology for superconducting quantum applications.
This acquisition, funded by the U.S. Microelectronics Commons through the NORDTECH hub, allows NYU to leverage this advanced high-rate plasma processing technology for superconducting nitrides, critical for quantum computing, sensing and communications. This capability directly supports the Lab-to-Fab mission of the Microelectronics Commons, a flagship initiative of the CHIPS and Science Act focused on strengthening U.S. microelectronics research, prototyping, and workforce development.
PlasmaPro ASP installed in NYU Nanofab
The PlasmaPro ASP ALD system is designed for producing superconducting nitrides essential for quantum applications, offering deposition rates three times faster than alternatives.
A collaboration led by NYU and published in Applied Physics Letters in November 2025 identified tantalum carbonitride (TaCₓN₁₋ₓ) as a superconducting material with low microwave loss, high kinetic inductance, and a wide superconducting gap, suitable for scalable quantum device fabrication using atomic precision plasma ALD.
“As an academic prototyping facility within the NORDTECH Hub, NYU Nanofab’s role is to enable new materials and processes that bridge fundamental research and scalable manufacturing for quantum technologies,” said Davood Shahrjerdi, Professor of Electrical and Computer Engineering at NYU Tandon and Director of the NYU Nanofab. “Extending this flagship capability to next-generation quantum hardware is a natural progression, as it could enable new materials and device architectures. We are excited about establishing this capability in our Nanofab and are grateful to Oxford Instruments for partnering with us to bring this vision to fruition.”
“Thin-film nitride superconductors have a number of key advantages over conventional superconducting materials used in quantum information platforms, which could make such systems more robust for operation at higher temperature, and under other non-ideal conditions, like in the presence of magnetic fields and light”, said Dr. Matthew LaHaye, who oversaw AFRL’s participation in the work. “Therefore, the ability to reliably pattern high-quality nitride thin films could ultimately help reduce costs of operating superconducting quantum platforms and facilitate the integration of such platforms with other technologies”.
"We are delighted to further strengthen the capability of NYU's Nanofab, with the installation of the first PlasmaPro ASP ALD system for superconducting nitrides within the USA. This technology will enable the team at NYU to accelerate the development of advanced semiconductor and quantum devices,” said Dr Harriet van der Vliet, Head of Strategic R&D Markets at Oxford Instruments Plasma Technology. “We are pleased to be strengthening our partnership with NYU and supporting the next generation of researchers."
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