Nov
29
2026 MRS Fall Meeting & Exhibit

Join us at the 2026 MRS Fall Meeting, taking place from November 30 - December 4, 2026, in Boston, Massachusetts. ​

We are excited to invite you to our booth #608, to explore how our systems can improve your research in quantum materials, 2D materials, structural materials and more.​

At our booth, we will be showcasing our nanoindentation technology, AFM, confocal Raman microscopy, and electron microscopy technologies. Additionally, we will hosting live demonstration of our AFM, Nanoindentation, and Raman systems so you see our tools in action.

We will have a Vero S AFM available in our booth for personalized demos. To secure your spot, please register using the form below.​

We encourage you to stop by our booth to explore the possibilities and discover how our advanced solutions can enhance your research and applications. We look forward to meeting you and discussing how Oxford Instrument scan contribute to your success at the 2026 MRS Fall Meeting.

Location

Boston, MA | USA

Booth Number

608

Date

November 29 - December 4

Businesses

Asylum Research, NanoAnalysis, NanoIndentation, Raman

Book a Demo

Oxford Instruments will be showcasing our cutting-edge technologies. This includes our nanoindentation technology, Atomic Force Microscopy (AFM), confocal Raman microscopy, and electron microscopy detectors. We are proud to unveil exciting developments that are currently in the pipeline and offer live demonstrations of our latest innovations. Visit our booth to experience firsthand the advancements we are making in these fields.


Vero S

Vero S is the standard ambient configuration of the next-generation Vero AFMs, which precisely and accurately measure true tip displacement using Quadrature Phase Differential Interferometry (QPDI).

Learn more about the Vero S


iX05 Operando Nanoindenter

The iX05 is a high-performance operando nanoindenter engineered to measure local mechanical properties under real-world conditions—including high/low temperatures, high strain rates, and liquid environments. Unlike traditional systems limited to lab settings, the iX05 enables testing in environments that reflect actual material applications. Powered by FemtoTools’ MEMS-based technology and fast control electronics, it delivers unmatched resolution, speed, and environmental control for advanced materials research.

Learn more about Nanoindentation

iX05 Operando Nanoindenter

witec360 Raman Microscope

witec360 Raman Microscope

The Oxford Instruments witec360 is the new benchmark for Raman imaging and correlative microscopy systems, designed to meet the growing demands of academic and industrial researchers for comprehensive analysis at the nanoscale.

Learn more about the witec360


Symmetry S4

For years, real-time pattern matching has been viewed as the next advancement in microscopy analysis. With Symmetry S4, that capability is now available directly within your workflow.

Symmetry S4 identifies and matches diffraction patterns in real time, enabling immediate feedback as data is acquired. By combining automated pattern recognition with on-the-fly analysis, researchers can make informed decisions faster and gain deeper insight during every experiment.

More than a new software capability, Symmetry S4 represents a new approach to microscopy, moving beyond data collection to real-time interpretation and discovery.

Learn more about Symmetry S4

Symmetry S4

Join us for a one-on-one or group demo for AFM, Nanoindentation, or Raman.

We will be featuring a live Vero AFM system, a remote iX05 nanoindenter, and a remote witec360 confocal Raman microscope at booth 608.

AFM Group Demos:​

Tuesday

3:00 p.m.: How to Achieve Atomic Lattice Resolution​

5:15 p.m.: Beyond Automation: Connecting AFM to AI

Wednesday

9:00 a.m.: Ferroelectrics Imaging with Interferometric Detection

10:00 a.m.: Beyond Automation: Connecting AFM to AI

2:00 p.m.: Moiré Imaging of Stacked 2D Materials

Thursday

9:30 a.m.: Beyond Automation: Connecting AFM to AI

10:15 a.m.: Ferroelectrics Imaging with Interferometric Detection


Learn how high-resolution Torsional Force Mode imaging can reveal moiré patterns and nanoscale structural features in stacked 2D materials.​

Explore nanoscale ferroelectric and piezoelectric properties with PFM, combining AFM topography with localized electromechanical measurements.​

Experience how easy it is to achieve atomic lattice resolution to characterize defects in 2D materials that affect their device performance​

AFM API Discussions with Asylum Research Experts to explore how APIs can connect AFM measurements to AI-driven decisions and scientific discovery.

Learn how MEMS-based nanoindentation enables large-area mechanical property mapping, revealing local variations in mechanical properties across complex materials and microstructures. Combined with EBSD and EDS datasets, this approach uncovers the influence of composition, crystallography, and microstructure on local mechanical behavior.

Learn how Raman, PL, and SHG imaging reveal the structure and optoelectronic properties of 2D materials.

As interest in 2D-material-based devices continues to grow, understanding atomic defects has become critical for optimizing performance. This tutorial series highlights AFM-based approaches for the routine detection and characterization of atomic-scale defects in TMDs and other 2D materials, combining practical measurement strategies with representative research applications.

Agenda

Learn More Here

Thursday, November 12: CAFM of atomic defects in TMDs

Matthew Rosenberger, Notre Dame

Thursday, December 10: LFM of atomic defects in 2D materials

Matthew Rosenberger, Notre Dame

Wednesday, January 20: CAFM imaging and electronic spectroscopy of atomic defects in 2D materials

Mehmet Baykara, University of California, Merced

Thursday, February 11: Autonomous defects detection & back-contact free CAFM

Umberto Celano, Arizona State University

Thursday, February 25: Higher eigenmode imaging of defects

Nikolai Severin, Humboldt University of Berlin

Thursday, March 11: Title to be determined

Jairo Valasco, University of California, Santa Cruz

Thursday, March 25: Understanding the physical mechanism behind atomic resolution imaging in conductive atomic force microscopy in air

Mario Lanza, National University of Singapore

Thursday, April 8: CAFM of defects in hBN

Matthew Rosenberger, Notre Dame