There’s been a rapid growth of interest in devices based on 2D materials. Defects in these 2D layers can affect their electronic and optoelectronic properties, especially in TMDs. Recently, there has been a focus in characterizing atomic defects to control and understand device performance.

This tutorial series focuses on the use of atomic force microscopy, AFM, for routine detection and characterization of atomic-scale defects in 2D materials. Traditional approaches, such as scanning tunneling microscopy and scanning transmission electron microscopy, offer exceptional spatial resolution, but can pose challenges in accessibility and practicality for routine measurements, required especially for process control. The series highlights a variety of AFM-based techniques for probing atomic defects in 2D materials. Presentations will combine representative results from a range of material systems with practical considerations for performing and interpreting these measurements, aiming to help researchers implement these techniques in their own laboratories.