Join Oxford Instruments at SPIE Photomask Technology and EUV — a focused yet powerful gathering of innovators and thought leaders shaping the future of EUV lithography and photomask development. As a key player in precision imaging, Oxford Instruments is committed to supporting advancements in metrology and inspection leveraging our advanced camera technologies.
With products that push sensitivity limits with the highest DUV QE options available, accelerate throughput with fast frame rates, and maximize collection efficiency with UV optimized optical components Oxford instruments has the best selection of EMCCD and sCMOS technologies for enhanced DUV applications.
Join us for Monday’s evening poster presentation to find out how to experience faster, more accurate EUV imaging with our direct detection sCMOS camera.
Title: “Seeing” more at 13.5 nm with EUV sCMOS Camera Technology
Presenter: Andrew Carpenter, PhD, Technical Sales Specialist
Monday | 6:00 – 7:30 PM
San Carlos III/IV
Location
Monterey, California | US
Booth Number
207
Date
September 22 - 25, 2025
Booth Number
207
Business
Andor
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