Unlocking Insight and Process Intelligence with PTIQ

OI Academy | Webinar
Unlocking Insight and Process Intelligence with PTIQ

Date: 30 July, 2026
Time: 08:00 BST | 14:00 SGT/TST | 15:00 JST/KST | 16:00 AEST

As AI adoption accelerates, the semiconductor industry must harness these technologies to enhance operational performance, process understanding, and optimization. Increasing plasma-processing complexity demands high resolution, well structured data as a foundation for innovation.

Oxford Instruments’ PTIQ software ecosystem addresses this need through millisecond level data capture, device hardware fingerprinting, advanced diagnostics, and trend analysis. These capabilities enable actionable insights, helping engineers detect performance drift, optimise process parameters, and establish reproducible, data rich workflows.

What you’ll learn

• How PTIQ enables deeper process insight through high-resolution data
• Approaches to detecting drift and improving process stability
• Perspectives on implementing AI and machine learning in semiconductor workflows
• Key applications including diagnostics, predictive modelling, and process optimisation

This talk will also highlight how facilities can prepare for practical AI and machine learning deployment—using PTIQ to drive visibility, reproducibility, and data-driven decision-making, from fault diagnostics and drift detection to predictive modelling and process intelligence.