Optimising ALD High-k Oxides for Novel Applications

Dr Harm Knoops is the Atomic Scale Segment Specialist at Oxford Instruments Plasma Technology and holds a part-time assistant p...Read more >

Dr Harm Knoops is the Atomic Scale Segment Specialist at Oxford Instruments Plasma Technology and holds a part-time assistant professorship position at the Eindhoven University of Technology. His work covers the fields of (plasma-based) synthesis of thin films, advanced diagnostics and understanding and developing plasma ALD, plasma ALE and growth of 2D materials. His main goals are to improve and advance atomic scale processes and applications for Oxford Instruments and its customers.

Daniel obtained his PhD in Physics from the University of Regensburg in 2009. In the same year, he joined AMO GmbH and become t...Read more >

Daniel obtained his PhD in Physics from the University of Regensburg in 2009. In the same year, he joined AMO GmbH and become the head of the graphene group, focusing on the exploitation of two-dimensional materials for electronic photonic and sensor applications. His expertise falls in the field of semiconductor processing, solid-state electronics and optoelectronic devices. He is the leader of the work-package on Electronic Devices of the Graphene Flagship (since 2013) and is coordinating the FET Open Project ORIGENAL.