The new Backscattered Electron and X-ray (BEX) technique is revolutionising elemental analysis in the Scanning Electron Microscope (SEM). Leveraging a novel design along with enhanced sensitivity and acquisition speed, BEX significantly extends the analytical capabilities of SEM, offering a compelling new method to add to traditional techniques such as Transmission Electron Microscopy (TEM) and Electron Probe Microanalysis (EPMA).
During this webinar, you will first learn about BEX and how it is used in combination with Energy Dispersive Spectrometry (EDS) to address analytical challenges. A key focus will be on analysing micro-segregation in steel, an application that typically presents significant challenges for conventional SEM-based methods. Such analyses have traditionally relied on EPMA, which offers better sensitivity, or TEM, known for its superior spatial resolution. However, these methods also come with limitations related to sample preparation, analysed area vs segregation scale, cost, and acquisition time.
We will illustrate how the BEX-EDS technique can provide an additional solution without these constraints and how it achieves elemental analysis with exceptional spatial resolution and sensitivity.
This webinar is organized in collaboration with Oxford University (UK) and the University of Lorraine (LEM3 France). We will be joined by Anjuli Bali, PhD student at Oxford University, where she investigates stress corrosion cracking (SCC) in nuclear reactor components. Dr. Nathalie Gey and Professor Alain Hazotte from LEM3 (France) will share results of segregation analysis in martensitic tool steel produced by additive manufacturing.
You will learn:
- Basics of the BEX technique, its use and applications
- How BEX is combined with EDS to solve challenging applications in the SEM
- Importance of analysing micro-segregation in steel and alloys
- How BEX and EDS were used to solve micro-segregations in steels, from nano-scale to macro-scale, and case studies in the aerospace and nuclear industries
Register for Session 1: 9:00 AM BST / 10:00 CET
Register for Session 2: 3:00 PM BST / 4:00 PM CET