Products
DEPOSITION TOOLSPlasma Enhanced Chemical Vapour Deposition (PECVD)Inductively Coupled Plasma Chemical Vapour Deposition (ICPCVD)Atomic Layer Deposition (ALD)Ion Beam Deposition (IBD)ETCH TOOLSInductively Coupled Plasma Etching (ICP RIE)Reactive Ion Etching (RIE)Deep Silicon Etching (DSiE)Atomic Layer Etching (ALE)Ion Beam Etching (IBE)
Learning
I’ve been hanging out with the
As shown in Figure 1 to the right, we divided the AFM into three separate components: (i) the optical detection system, (ii) the cantilever and (iii) the sample. The question we tried to answer was simple: Which of the three boundaries—between the detector and cantilever, the detector and sample or the cantilever and sample—was more susceptible to external vibration noise? 

Figure 4 (right). A Cypher in an unfriendly environment. An accelerometer was placed on the table and its signal measured with the auxiliary input on the ARC controller while the AFM was simultaneously being used to image a calcite surface in fluid.