Sep
2
SEMICON Taiwan 2026

Meet Oxford Instruments at SEMICON Taiwan 2026

Join Oxford Instruments at SEMICON Taiwan 2026 to explore our cutting-edge solutions for semiconductor manufacturing, failure analysis, and electrical characterisation. From advanced plasma processing to nanoscale characterisation, we empower innovators to push the boundaries of device performance and reliability. Visit our booth (#I2022) to speak with our experts and discover how we can collaborate to improve the reliability and performance of your semiconductor devices.

Highlighted Solutions:

  • Atomfab ALD: High-throughput Atomic Layer Deposition (ALD) system designed for large-scale manufacturing of advanced semiconductor devices, including GaN power devices. Known for exceptional uniformity, conformality, and low cost per wafer.
  • PlasmaPro 100: Versatile plasma etch platforms capable of handling a variety of etching processes for MEMS, sensors, and power devices in high-volume manufacturing environments. Offers excellent process control and uniformity for consistent results.
  • Ionbeam: Our ion beam etch (IBE) & deposition (IBD) system is a popular choice for high-quality material processing. Flexible hardware options include open load, single-substrate load lock, and cassette-to-cassette configurations. Specifications are tailored to each application, enabling faster, repeatable process results.
  • Ultim Extreme Infinity (EDS): Energy Dispersive Spectroscopy (EDS) systems known for their superior resolution, speed, and reliability, enabling rapid elemental analysis and mapping for process monitoring, quality control, and failure analysis in semiconductor devices.
  • Symmetry S3 (EBSD): A fast and accurate Electron Backscatter Diffraction (EBSD) system for high resolution analysis of grain structure, crystal orientation, and strain.
  • WITec alpha300 Raman Microscopes: Enable non-destructive, label-free chemical characterisation with high spectral and spatial resolution, offering comprehensive analysis for diverse materials and life science applications without sample preparation.
  • Jupiter XR Atomic Force Microscope (AFM): Delivers exceptional resolution, large sample capacity, and rapid scanning, providing fast, precise, and adaptable performance for advanced materials research and industrial applications.
  • FemtoTools Nanoindenter: Instruments for the reliable and precise characterisation of mechanical properties in a wide variety of applications.

We're excited to connect with you at Booth #I2022, and our team is eager to discuss your unique challenges and demonstrate how our advanced technologies can accelerate your research or improve your processes. 

Technical Booth Presentation

Join our technical booth presentations by Hank Lin.

Head of Sales, J-KAST
Hank Lin
Head of Sales, J-KAST

Sep 2 (Wed) | 14:00 – 14:40

Next-Gen Indium Phosphide: Optoelectronic Device Manufacturing

Sep 3 (Thurs) | 14:00 – 14:40

Revolutionizing GaN Devices: Plasma Processing for High-Volume Production

Register now to secure your spot—seats are limited!
*Catering will be provided.

Secure your spot now!


Location

TaiNEX 1&2, Taipei

Date

September 2 - 4, 2026

Booth Number

I2022, 1st Floor, TaiNEX 1

Join our technical booth presentations by Hank Lin.

Register now to secure your spot—seats are limited!

Secure your spot now!


Book a meeting

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