Join us at OFC 2026 – The Premier Optical Networking and Communications Event

Discover the Future of Semiconductor Fabrication with Plasma Technology

At OFC 2026, explore how Plasma Technology’s advanced etch and deposition solutions are driving innovation in next-generation semiconductor devices. Our cutting-edge technologies enable high-yield , efficient, and reliable production for critical markets such as datacom, power devices, and quantum computing.

Our Expertise includes:

• Plasma Etch & Deposition – Precision processes for superior device performance.

• Atomic Layer Etch (ALE) & Atomic Layer Deposition (ALD) – Ultra-thin, controlled layers for advanced architectures.

• Ion Beam Etch & Deposition – High-accuracy solutions for demanding applications

From R&D system to fully clusterable, high-volume production platforms, we deliver robust, high-uptime solutions designed to meet the challenges of modern semiconductor fabrication.

Why Meet Us at OFC?

• Learn how our technologies enable next-gen optical and photonic devices.
• Discuss your fabrication challenges with our industry-leading experts.
• Explore solutions that scale from research labs to high-volume fabs.

Interested in learning more?

Book a meeting with our experts and discover how Plasma Technology can accelerate your innovations.