We are honoured to be a sponsor of the Workshop on “Novel (2D) Materials and Their Applications”, which will be held at the RWTH Aachen University, Germany.
The event will focus on recent advances and future perspectives of two-dimensional materials in electronic applications, highlighting novel device concepts, materials integration, and emerging technologies.
For further information, visit the workshop's webpage.
We are delighted to announce that during the upcoming event, our experts, Dr Sarah Riazimehr, will be giving a presentation, while Dr Amir Ghiami will showcase a poster on the topics listed below.
The Oxford Instruments team looks forward to welcoming you to the workshop at our booth to discuss your current projects and workflows. If you're interested in arranging a meeting with us during the event, please complete the form below.
Location
Aachen | Germany
Date
3-4 March 2026
Business
Plasma Technology
Dr Sarah Riazimehr
Talk Title: From Surface Cleaning to Dielectric Integration: Plasma-Enhanced ALD on 2D Materials
Date: 4th of March 2026 (Wednesday), 10:30-10:45 am
The integration of two-dimensional materials into functional devices is fundamentally limited by challenges related to surface and interface quality. Surface contamination introduced during transfer and patterning degrades performance, while the inherently thin and sensitive nature of 2D layers makes them particularly vulnerable to damage during dielectric deposition using conventional techniques.
To address these challenges, in this talk, we present an in-situ approach using an Oxford Instruments plasma-enhanced ALD system that integrates controlled surface engineering with low-damage dielectric deposition, enabling continuous in-situ processing while preserving the intrinsic properties of 2D materials.
Dr Sarah Riazimehr is a Researcher in Residence at Oxford Instruments Plasma Technology, based at AMO GmbH. She contributes to Oxford Instruments Plasma Technology's experimental activities within the 2D Pilot Line (2DPL) project. Her work focuses on developing scalable, damage-free dielectric deposition processes for 2D materials using the Oxford Instruments Atomfab and PP ASP ALD systems, as well as surface cleaning and preparation of 2D materials prior to dielectric deposition.
Dr Amir Ghiami
Poster Title: Plasma-enhanced ALD Strategies for Clean Interfaces
and Dielectric Growth on 2D Materials
Date: 3rd of March (Tuesday), 6:15-9:00 pm
Two-dimensional (2D) materials, known for their exceptional electronic, physical, and chemical properties, are rapidly advancing the landscape of solid-state micro- and nanoelectronic devices. However, fully leveraging their potential still requires overcoming key challenges. We provide solutions for 2D material processing and device integration based on Oxford Instruments Plasma Technology. In this work, we review our plasma-enhanced ALD system, AtomFab, highlighting its capabilities for damage-free dielectric deposition on 2D materials and its role in enabling reliable device integration. We also present insights into the quality of the 2D/dielectric interface, supported by advanced characterisation techniques.
Dr Amir Ghiami is a Researcher at Oxford Instruments Plasma Technology, currently based at AMO GmbH in Germany. He specialises in epitaxial growth, damage-free dielectric deposition, and characterisation of 2D materials, as well as their integration into device structures for different (opto-)electronic applications. He is committed to delivering innovative solutions using Oxford Instruments’ tools to overcome key challenges in the 2D material field and strengthen the company’s position in this area.
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