Dr Harm C.M. Knoops

Date: TBC

Talk Title: .........................

Dr Harm C.M. Knoops is the Atomic Scale Segment expert at Oxford Instruments Plasma Technology and holds a part-time assistant professorship position at the Eindhoven University of Technology. His work covers the fields of (plasma-based) synthesis of thin films, advanced diagnostics and understanding and developing plasma ALD, plasma ALE and growth of 2D materials. His main goals are to improve and advance atomic scale processes and applications for Oxford Instruments and its customers.

Amir Ghiami

Date: TBC

Poster title: Plasma-enhanced ALD Strategies for Clean Interfaces and Dielectric Growth on 2D Materials

Dr Amir Ghiami is a researcher at Oxford Instruments Plasma Technology, currently based at AMO GmbH in Germany. He specialises in epitaxial growth, damage-free dielectric deposition, and characterisation of 2D materials, as well as their integration into device structures for different (opto-)electronic applications. He is committed to delivering innovative solutions using Oxford Instruments’ tools to overcome key challenges in the 2D material field and strengthen the company’s position in this area.