We are excited to announce our sponsorship of the Novel High-k Application Workshop 2026 hosted by NaMLab. This event will explore the use of high-k dielectric materials in micro and nanoelectronics. It will tackle the latest challenges associated with these materials and facilitate discussions on recent experimental findings related to devices, processing technologies, reliability, and the characterisation of high-k dielectrics in silicon-based micro- and nanoelectronics.
We are pleased to share that during the upcoming event, our experts, Dr Roger Proksch and Dr Amir Ghiami, will be giving presentations on the following subjects below.
The Oxford Instruments Plasma Technology team is excited to connect with you and learn more about your projects and workflows! If you'd like to set up a meeting with us during the workshop, simply fill out the form below. For further information, visit the NaMLab event website.
Location
Dresden, Germany
Date
24-26 March 2026
Businesses
Asylum Research, Plasma Technology
The event is hosted by
Dr Roger Proksch
Date: 12:00 pm, 25 March, 2026
Session: Characterisation
Talk's Title: TBD
Dr Roger Group is a Group Technology Director / Chief Technology Officer for Asylum Research and Oxford Instruments.
Dr Amir Ghiami
Date: 09:00 am, 26 March, 2026
Session: AIScN
Talk's Title: TBD
Dr Amir Ghiami will also be presenting his poster during the conference's breaks.
Poster's Title: TBD
Dr Amir Ghiami is a Researcher at Oxford Instruments Plasma Technology, currently based at AMO GmbH in Germany.
He specialises in epitaxial growth, damage-free dielectric deposition, and characterisation of 2D materials, as well as their integration into device structures for different (opto-)electronic applications. He is committed to delivering innovative solutions using Oxford Instruments’ tools to overcome key challenges in the 2D material field and strengthen the company’s position in this area.
Visit the Namlab High K Workshop 2026 Program
© Oxford Instruments 2026