Mar
11
NaMLab High-k Application Workshop 2026

Meet Oxford Instruments at the Novel High-k Application Workshop

We are excited to announce our sponsorship of the Novel High-k Application Workshop 2026 hosted by NaMLab. This event will explore the use of high-k dielectric materials in micro and nanoelectronics. It will tackle the latest challenges associated with these materials and facilitate discussions on recent experimental findings related to devices, processing technologies, reliability, and the characterisation of high-k dielectrics in silicon-based micro- and nanoelectronics.

The Oxford Instruments Plasma Technology team is excited to connect with you and learn more about your projects and workflows! If you'd like to set up a meeting with us during the workshop, simply fill out the form below.  For further information, visit the NaMLab event website.

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Location

Dresden, Germany

Date

24-26 March 2026

Business

Plasma Technology

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The event is hosted by

namlab

Meet the Presenter

Dr Harm Knoops
Dr Harm Knoops

Dr Harm Knoops

Date: 09:00 am, 12 March, 2024
Session: High K Dialectrics

Title: Plasma ALD and ALE for High-k Dielectrics


Dr Harm Knoops is the Atomic Scale Segment Specialist at Oxford Instruments Plasma Technology and holds a part-time assistant professorship position at the Eindhoven University of Technology. His work covers the fields of (plasma-based) synthesis of thin films, advanced diagnostics, and understanding and developing plasma ALD, plasma ALE and growth of 2D materials. His main goals are to improve and advance atomic scale processes and applications for Oxford Instruments and its customers.


Visit Namlab High K Workshop 2024 Agenda

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