Oxford Instruments Plasma Technology is delighted to participate in MNF Day 2026, taking place on 28 October 2026 at the Center for Soft Nanoscience (SoN), at the University department in Münster, Germany.
The annual event brings together researchers, students, facility users, and industry partners for a day of scientific exchange, networking, poster presentations, and technology exhibitions focused on nanoscience and nanofabrication. For further information, visit the MNF 2026 webpage.
As a leading provider of advanced plasma processing solutions, Oxford Instruments supports the development of next-generation devices and materials through innovative etch and deposition technologies. Our portfolio includes industry-leading ICP etch and deposition, RIE, PECVD, ALD, and ALE systems, enabling precise and reliable fabrication processes, from fundamental research through to manufacturing.
We are delighted to announce that during the upcoming event, our expert, Dr Owain Thomas, will be giving a presentation.
The Oxford Instruments Plasma Technology team looks forward to meeting researchers, students, and industry professionals at MNF Day 2026 and discussing how our technologies can support your current and future projects.
Location
Center for Soft Nanoscience, Münster-Gievenbeck, Germany
Date
28 October 2026
Booth No:
Oxford Instruments
Business
Plasma Technology
Talk Title: New advances in Plasma etching and deposition
Date: 28 October 2026
This presentation will highlight advanced plasma processing solutions for next-generation optoelectronic and quantum devices. It will cover atomic-scale precision through Controlled Atomic Layer Etching (ALE) of lithium niobate, enabling monolayer-level material removal with minimal damage. The talk will also explore superconducting Through-Silicon Via (TSV) fabrication for quantum computing, combining plasma processing and Atomic Layer Deposition (ALD) to achieve high-quality superconducting structures. Finally, it will present high-throughput, highly selective etch processes for GaAs VCSELs and InP DFB lasers, addressing key manufacturing requirements including profile control, smooth sidewalls, and wafer-scale uniformity.
Dr Owain Thomas
A PhD and a first-class honours science graduate who has more than 20 years of experience within an international semiconductor business environment, gained through top-quality, innovative work coupled with a highly motivated approach and strong interpersonal and management skills.
Currently working at Oxford Instruments Plasma Technology as the Head of Commercial Solutions, responsible for delivering multimillion-pound equipment for the semiconductor market. Managing a highly skilled team and part of the senior management team, contributing to key business decisions, including drivers for improved productivity and business growth across the whole organisation.
© Oxford Instruments 2026