Sep
15
MNE 2026

We will be exhibiting in MNE 2026

Micro and Nano Engineering (MNE 2026) is one of the most important international conferences that unites engineers and scientists to explore recent advancements and emerging trends in the creation, production, functionality, and utilisation of micro and nanostructures and devices.

The Oxford Instruments Plasma Technology team would like to welcome you to our booth to discuss your current projects and workflows. If you'd like to arrange a meeting with us at the event, please complete the form below.

For further information, visit the MNE 2026 website.

Book a meeting

Location

Interlaken, Switzerland

Date

21-24 September 2026

Booth

TBC

Business

Plasma Technology

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Meet our Experts

Dr Magdalena Ulmeanu
Dr Magdalena Ulmeanu

Dr Magdalena Ulmeanu is an Applications Engineer at Oxford Instruments Plasma Technology. Her work covers the field of plasma etching processes with a focus on Cryogenic Silicon Etching and Mixed Gas Silicon Etching.

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Arjun Moothedath
Arjun Moothedath

Arjun Moothedath is an Application Engineer (Etch) at Oxford Instruments Plasma Technology, UK. With a background in Electronics and Communication Engineering, he specialises in silicon-based process development. Currently, his main focus is on developing the Bosch silicon etching process using the PlasmaPro 100 Estrelas Deep Reactive Ion Etch (DRIE) tools.

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Visit MNE Program 2026

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