We are pleased to be a Silver Sponsor of MicroLED Connect and AR/VR Connect 2026. The event will explore key challenges and opportunities in microLED, AR, VR, and XR technologies, bringing together leading companies across the global display value chain. For further information, visit the MicroLED Connect and AR/VR Connect webpage.
Oxford Instruments Plasma Technology supports the development and manufacturing of advanced AR devices with plasma and ion beam processing solutions for waveguides, optical combiners, and microdisplay components. Our technologies enable the precise etching and profile control required to achieve high optical performance and scalable manufacturing of next-generation AR systems.
Take advantage of an exclusive 50% discount on your MicroLED Connect and AR/VR Connect 2026 attendee pass, available exclusively to Oxford Instruments customers and our booth visitors.
To receive your discounted registration code, book a meeting with our team below.
Location
High Tech Campus in Eindhoven, the Netherlands
Date
16 - 17 September 2026
Booth No:
A26
Business
Plasma Technology
Dr Paulo Lima is an Ion Beam Plasma Technologist with 27 years of experience in the field of Plasma Science and Technology. Graduated in Physics, Paulo has a master's degree in Plasma Science and a doctoral degree in Plasma Processes Applied to Microelectronics. Paulo has worked for 15 years in the Plasma Equipment Semiconductor Industry in the United Kingdom and in Europe. Paulo has 6 patents accepted in Semiconductor Plasma Equipment and has published more than 20 papers in Plasma Science.
Talk Title: Broad Ion Beam Processing for Scalable Manufacturing of Blazed Gratings for AR Waveguides
Date: Wednesday, 16 September, 5:20 pm
Location: Track 2 - Room Ernst & Curie (1st Floor)
As Augmented Reality devices move toward mass adoption, waveguide optics require higher efficiency, improved image quality, and scalable manufacturing processes. This presentation explores a Broad Ion Beam processing approach for fabricating and finishing blazed surface relief gratings on 200 mm wafers. The technique delivers excellent blaze angle and etch depth uniformity while significantly reducing surface roughness. The results demonstrate a practical, wafer scale manufacturing route for high-performance AR waveguides, supporting both R&D and high-volume production of next-generation AR optics.
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