Oxford Instruments is proud to be a Platinum sponsor for the 9th International Conference ALD FOR INDUSTRY, which will open its doors from 17th to 18th March 2026 in Eindhoven, Netherlands. The event will highlight the latest advancements in ALD processes, including simulations and characterisation techniques for coatings, precursor materials, and ALD systems tailored for specific applications.
The Oxford Instruments team is looking forward to welcoming you to the workshop in our booth to discuss your current projects and workflows. If you would like to schedule a meeting with us at the event, please fill out the form below. For further information, visit the ALD for Industry 2026 webpage.
We are honoured to announce that our expert, Dr Harm C.M. Knoops, will be one of the Program Committee members and serve as the local chair for this coming conference. Furthermore, Dr Knoops will be representing Oxford Instruments and will present a talk on the topic mentioned below. For more details, check the ALD for Industry 2026 Program.
Location
Eindhoven, Netherlands
Date
17-18 March 2026
Booth
Oxford Instruments booth
Business
Plasma Technology
Dr Harm C.M. Knoops
Date: Wednesday, March 18 2026
SESSION 4 | Future Applications - part 2, 12:10 | OR0404
Title: Fast remote plasma ALD and its applications
To provide high-quality material, the use of plasma in ALD has high interest. To limit damage, energies and fluxes of species to the surface has to be controlled. Remote plasma improves control of plasma species while maintaining high plasma density. The innovative remote plasma source on the Atomfab is optimized for ALD on power electronics devices for substrates up to 200 mm in diameter and allows for Al2O3 cycles of less than one second. This application showcases the low damage nature of this remote plasma system. Many other applications could benefit from fast remote plasma ALD which will be discussed. To facilitate process development, a fast research system PP ASP has been developed, using the same plasma source. In this newer ALD system the ion energy can also be enhanced by substrate biasing which further enhances the parameter space and possible applications. Processes for superconducting quantum devices will be showcased as a potential application.
Dr Harm C.M. Knoops is the Atomic Scale Segment expert at Oxford Instruments Plasma Technology and holds a part-time assistant professorship position at the Eindhoven University of Technology. His work covers the fields of (plasma-based) synthesis of thin films, advanced diagnostics and understanding and developing plasma ALD, plasma ALE and growth of 2D materials. His main goals are to improve and advance atomic scale processes and applications for Oxford Instruments and its customers.
© Oxford Instruments 2026