The team from Oxford Instruments will be at the 2D-NL Conference 2026, which will focus on cutting-edge and deep-tech sectors in the Netherlands. The agenda includes key talks and interactive sessions covering everything from applications and characterisation to fundamentals and growth.
If you're in research, working in high-tech, or interested in the future of advanced materials, this conference is a perfect opportunity to meet our experts and discover our plasma processing systems and solutions.
At the upcoming conference, our experts, Dr Harm Knoops and Dr Amir Ghiami, will be presenting on the subjects outlined below.
For additional event details, please refer to the 2D-NL Conference 2026 webpage.
If you wish to schedule a meeting with us during the event, kindly fill out the form provided below.
Location
Eindhoven | Netherlands
Date
26 - 27 May 2026
Business
Plasma Technology
Talk's title: Atomic Scale Processing for 2D devices
Date: 26 May 2026 (Tuesday)
Time: 15-minute presentation during the main afternoon (lunch) break
During the presentation, we will outline the benefits of our Atomfab/PlasmaPro ASP system, detailing its effectiveness for ALD on 2D devices and its low-damage characteristics. We will also touch on various general processing issues and will provide insights into our contributions that benefit 2D applications. Additionally, we will address our ALE systems and highlight our advanced position in research and development.
Dr Harm Knoops is the Atomic Scale Segment Specialist at Oxford Instruments Plasma Technology and holds a part-time assistant professorship position at the Eindhoven University of Technology. His work covers the fields of (plasma-based) synthesis of thin films, advanced diagnostics and understanding and developing plasma ALD, plasma ALE and growth of 2D materials. His main goals are to improve and advance atomic scale processes and applications for Oxford Instruments and its customers.
Poster's title: Facilitating 2D Device Integration based on Plasma ALD Strategies
Date: 26 May 2026 (Tuesday), during the breaks between: 11:40 am - 1:00 pm and 3:10 pm - 3:40 pm
In this work, we present how Oxford Instruments Plasma Technology enables scalable integration of graphene and 2D TMDs through plasma‑enabled ALD strategies using the AtomFab™ platform. We highlight the characteristics of the AtomFab plasma source and its ability to deliver low‑damage, highly controlled surface functionalisation required for uniform dielectric growth on chemically inert 2D materials. Case studies focus on plasma‑assisted dielectric integration schemes that preserve channel properties while achieving high‑quality interfaces essential for device fabrication. In addition, we demonstrate plasma‑based polymer residue removal approaches tailored for transferred 2D materials, addressing a key bottleneck in achieving clean surfaces without inducing structural or electronic degradation. Together, these processes position plasma ALD and plasma surface engineering as critical enablers for reliable 2D device integration.
Dr Amir Ghiami is a Researcher at Oxford Instruments Plasma Technology, currently based at AMO GmbH in Germany.
He specialises in epitaxial growth, damage-free dielectric deposition, and characterisation of 2D materials, as well as their integration into device structures for different (opto-)electronic applications. He is committed to delivering innovative solutions using Oxford Instruments’ tools to overcome key challenges in the 2D material field and strengthen the company’s position in this area.
© Oxford Instruments 2026