MNE 2022

Meet Oxford Instruments at the 48th International Conference on Micro & Nano Engineering 2022 (Booth No. S12).

Micro and Nano Engineering (MNE EUROSENSORS 2022 tagged as MNE-ES 2022) is one of the most important international conferences dedicated to micro- and nano-fabrication industry. During the 48th edition of the event, the participants will have the opportunity to take part in many related parallel sessions, plenary discussions, presentations, commercial exhibitions, and several awards as well as in Plasma Etch and Strip for Microtechnology workshops and special sessions on Superconducting Micro- and Nano-Devices.

Oxford Instruments Plasma Technology team is looking forward to welcoming you to Leuven in September 2022 to discuss your current projects and workflows. If you would like to book a meeting with us during the event, please complete the form below. For further information: go to the MNE 2022

During the MNE Conference, Dr Harm Knoops, Atomic Scale Segment Specialist in Oxford Instruments Plasma Technology, will be giving a talk on Monday, the 19th of September at 16:30 pm (ECT).

Talk Tile: Industrial Perspectives of Atomic-Scale Processing Technologies

Atomic-scale processing (ASP) methods such as atomic layer deposition (ALD), atomic layer etching (ALE) and even other atomic-scale methods such as 2D materials growth have become increasingly popular. This tutorial will start with the basics of these ASP methods and tools needed. A selection of application fields will be discussed. Many new application fields could benefit from ASP, where the strongest drive comes from the logic, memory, and patterning requirements. A few factors for these fields will be highlighted here, but the tutorial will also consider other fields such as power electronics, quantum technology, and optical data communication.

Visit Monday Tutorial Agenda


Leuven, Belgium


19-23 September 2022

Booth Number



Plasma Technology

Event Website

Meet the Presenter

Harm Knoops
Harm Knoops

Dr Harm Knoops is the Atomic Scale Segment Specialist at Oxford Instruments Plasma Technology and holds a part-time assistant professorship position at the Eindhoven University of Technology. His work covers the fields of (plasma-based) synthesis of thin films, advanced diagnostics and understanding and developing plasma ALD, plasma ALE and growth of 2D materials. His main goals are to improve and advance atomic scale processes and applications for Oxford Instruments and its customers.

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