International Workshop on Plasma Cryogenic Etching Processes (PlaCEP)

1st international Workshop on Plasma Cryo Etching Processes

We are excited to be sponsoring the first  International Workshop on Plasma Cryo Etching Processes (PlaCEP).


PlaCEP is a gathering of enthusiastic scientists and engineers in the field of cryogenic etching of semiconductor-based materials using e.g. SF6, HBr or Cl2-plasma chemistry at temperatures below -10°C. It includes the modelling, simulation and/or experimental (atomic layer) etching of conventional materials like silicon, germanium, gallium arsenide, indium phosphide and emerging materials (2D materials like graphene or MoS2), but also its oxide and nitride ceramic compounds

Find out more: PlaCEP

We're looking forward to meeting you at the event and discussing your current work and workflows with you. If you would like to book a meeting with us at the show, please complete the form below.


Orleans, France


5-7 May 2020


Plasma Technology

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