PlaCEP is a gathering of enthusiastic scientists and engineers in the field of cryogenic etching of semiconductor-based materials using e.g. SF₆, HBr or Cl₂-plasma chemistry at temperatures below -10°^C. It includes the modelling, simulation and/or experimental (atomic layer) etching of conventional materials like silicon, germanium, gallium arsenide, indium phosphide and emerging materials (2D materials like graphene or MoS₂), but also its oxide and nitride ceramic compounds

Find out more: PlaCEP

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