Sep
20

Graphene Week 2021

As proud members of the European Graphene Flagship, we are excited to be exhibiting virtually in Graphene Week on 20 - 24 September 2021. Europe's leading Graphene Conference brings together 200 experts from industry and academia to share ideas and discuss the latest innovations regarding Graphene and layered materials. The Graphene Conference will cover different topics, regarding research, innovation and inspiration.

View the full agenda on graphene-flagship.eu

Collaborating with leading European semiconductor foundries and research institutions, at Oxford Instruments Plasma Technology we have a wealth of experience in fabrication of 2D materials and graphene, which we use to improve next-generation device performance. 

During Graphene Week, Dr Ravi Sundaram and Dr Harm Knoops will be participating in a round table to talk "From labs to pilot lines : Graphene and related materials device fabrication solutions”. The date of this talk is on Wednesday 22nd September 4:10 - 4:30 pm (CEST).

Location

Virtual

Business

Plasma Technology

Oxford Instruments Plasma Technology Join European Flagship funded pilot line

Read the Press Release

Meet the Experts

Dr Ravi Sundaram

Dr Ravi Sundaram
Market Manager for Research & Emerging Technologies

Ravi has been involved in materials research in several institutions such as EPFL, Switzerland, Max Planck Institute Stuttgart, Germany, IBM T.J Watson Research Labs, NY and Cambridge University where he worked on several aspects of 1D and 2D materials-based research from synthesis, fundamental science to prototype applications in sensors, optoelectronics and electronics. 

He joined Oxford Instruments to lead and coordinate R&D efforts towards 2D materials products. Currently, he is responsible for scoping out and developing a strategy for emerging technology markets such as 2Dmaterials, biomedical devices, integrated photonics, Quantum Technologies among others.

 

Dr Harm Knoops

Dr Harm Knoops
Atomic Scale Segment Specialist

Dr Harm Knoops is the Atomic Scale Segment Specialist at Oxford Instruments Plasma Technology and holds a part-time assistant professorship position at the Eindhoven University of Technology. His current work covers the fields of (plasma-based) synthesis of thin films, advanced diagnostics and understanding and developing plasma ALD. His main goals are to improve and advance atomic-scale processes and applications for Oxford Instruments and its customers. His recent involvement in applying RF substrate biasing during plasma ALD and the growth of 2D-MoS2 by plasma ALD have been well-received by the field.

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