SPIE Advanced Lithography

SPIE Advanced Lithography 2022

For over 40 years, SPIE Advanced Lithography has played a key role in bringing together the micro- and nanolithography community. Lithography continues to be challenged to extend into ever-shrinking generations, yet remain manufacturable and cost-effective.

Talks

Wednesday 26 February 2020

  • SESSION 5:  Low damage etching by Inductively Coupled Plasma (ICP) and Atomic Layer Etching (ALE) of III-V materials to enable next generation device performance. Author(s): Maxime Darnon, Andy Goodyear, Stephanie Baclet, Oxford Instruments Plasma Technology.

  • SESSION 6: Atomic Layer Etching of III-V materials to enable next generation device performance (Invited Paper), Mark Dineen, Oxford Instruments Plasma Technology.

We're looking forward to meeting you at the event and discussing your current work and workflows with you. If you would like to book a meeting with us at the conference, please complete the form below.

For further information: SPIE Advanced Lithography

Location

San Jose, California, USA

Date

23-27 February 2020

Business

Plasma Technology

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