Mar
30

Dry Processing Workshop at NaMLab

DRY PROCESSING WORKSHOP: DEPOSITION & ETCHING

An interactive workshop for Oxford Instruments users, presented by Oxford Instruments Plasma Technology at NaMLab.

This 1 day event will be held at the NaMLab facility in Dresden, Germany.

Location

Dresden, Germany

Business

Plasma Technology


Hosted at NaMLab REGISTER NOW

SPEAKERS AND TOPICS

  • Atomic Layer Deposition (ALD) of high-quality gate dielectrics to enable next generation GaN HEMTs 
    Dr Tania Hemakumara, Oxford Instruments
  • Ion Beam Etch (IBE) for angled features – A unique capability 
    Chris Hodson, Oxford Instruments
  • High Volume Manufacturing plasma processing for Compound Semiconductor based devices e.g. VCSELs, EEL and SiC PE 
    Robert Gunn, Oxford Instruments
  • A review of deep Si etch techniques and their application to device manufacturing – Cryo, Bosch, mixed gas; which one is best to use for which application?
    Robert Gunn, Oxford Instruments
  • Impact of precursor chemistry on the crystallization behavior of ALD deposited doped HfO2 films
    Frau Richter, NaMLab
DOWNLOAD FULL AGENDA
  • Latest advances in Atomic Layer Etching (ALE) 
    Dr Tania Hemakumara, Oxford Instruments
  • How to use End Point Detection techniques to monitor and control plasma processes 
    David Hooper, Oxford Instruments
  • Process chamber management and achieving maximum system uptime using plasma cleaning
    David Hooper, Oxford Instruments
  • Growth and characterisation of graphene and other 2D materials – status and understanding of where they could be used
    Chris Hodson, Oxford Instruments
  • LAB TOUR
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Previous Events

The annual NaMLab High k workshop takes place after this event on 31 March 2020 - 1 April 2020 at NaMLab in Dresden, Germany