Sep
17

Dry Processing Workshop

Location

TU Vienna

Business

Plasma Technology

Download the agenda Register your place

Workshop on Dry Processing for Nanoelectronics & Micromechanics Deposition & Etching, Presented by Oxford Instruments Plasma Technology and TU Vienna. Please see below for confirmed talk titles.

Tuesday 17 September 2019

Talk Title Presenter Organisation
Dry Etching for MEMS Applications Dr Zhong Ren Oxford Instruments 
Field Emission Scanning Probe Lithography & Cryogenic Plasma Etching for beyond CMOS devices Dr Martin Hofmann TU Ilmenau
Tuning Materials Properties in Plasma ALD by Substrate Biasing Dr Harm Knoops Oxford Instruments
Atomic Layer Etching (ALE) Dr Matthew Loveday Oxford Instruments
SiC Etching for Via Holes & Feature for RF & Power Applications Dr Samantha Mazzamuto Oxford Instruments
Graphene & 2D Materials-based Devices for the Optoelectronics Industry: (PE) CVD, (PE) ALD, RIE & ALE Francesco Reale Oxford Instruments
Review of InP Etch Process Including End Point Detection & Plasma Clean Processes Dr Katie Hore Oxford Instruments
Plasma Deposition PECVD vs ICP PECVD Dr Owain Thomas Oxford Instruments
Review of AlGaAs/GaAs Processing for VCSEL Fabrication Dr Katie Hore Oxford Instruments
Deep Etching of Interband Cascade Laser Ridge-Waveguides Johannes Hillbrand FKE und ZMNS, TU Wien

Wednesday 18 September 2019

Talk Title Presenter Organisation
Etching of InP & GaAs by Ion beam Dr Sebastien Pochon  Oxford Instruments
Investigation of the Transition Layer Properties of Plasma Oxidized SiC-SiO2 Stacks Gernot Fleckl TU Wien - ISAS
End Point for Ion Beam Applications Dr Sebastien Pochon  Oxford Instruments
Efficient Plasma Cleaning for PECVD Dr Owain Thomas  Oxford Instruments
ZnO Optoelectronics using Plasma-based Processing Borislav Hinkov FKE und ZMNS, TU Wien
Diamond Etching – Applications & Challenges Dr Andrew Newton Oxford Instruments
GaN Low Damage Etch by ICP RIE & ALE Dr Matthew Loveday Oxford Instruments
Silicon Etching for Low Loss Integrated Photonics Components Dr Zhong Ren Oxford Instruments
Double-metal Waveguide Fabrication for High Performance THz QCLs Martin Kainz u. ZMNS, TU Wien
Fabrication of Biomedical Devices: An Overview of Relevant Plasma Processing Technology Dr Harm Knoops
Oxford Instruments
Ion Beam Deposition of Nanolayers of VOx & other Materials Pauline Alvarez  Oxford Instruments

Register your place

Cost Per Person: 240, to include the 2 day seminar and dinner event on 17th of September

You will be sent further joining information after registering.