Talk Title | Presenter | Organisation |
Dry Etching for MEMS Applications | Dr Zhong Ren | Oxford Instruments |
Field Emission Scanning Probe Lithography & Cryogenic Plasma Etching for beyond CMOS devices | Dr Martin Hofmann | TU Ilmenau |
Tuning Materials Properties in Plasma ALD by Substrate Biasing | Dr Harm Knoops | Oxford Instruments |
Atomic Layer Etching (ALE) | Dr Matthew Loveday | Oxford Instruments |
SiC Etching for Via Holes & Feature for RF & Power Applications | Dr Samantha Mazzamuto | Oxford Instruments |
Graphene & 2D Materials-based Devices for the Optoelectronics Industry: (PE) CVD, (PE) ALD, RIE & ALE | Francesco Reale | Oxford Instruments |
Review of InP Etch Process Including End Point Detection & Plasma Clean Processes | Dr Katie Hore | Oxford Instruments |
Plasma Deposition PECVD vs ICP PECVD | Dr Owain Thomas | Oxford Instruments |
Review of AlGaAs/GaAs Processing for VCSEL Fabrication | Dr Katie Hore | Oxford Instruments |
Deep Etching of Interband Cascade Laser Ridge-Waveguides | Johannes Hillbrand | FKE und ZMNS, TU Wien |
Talk Title | Presenter | Organisation |
Etching of InP & GaAs by Ion beam | Dr Sebastien Pochon | Oxford Instruments |
Investigation of the Transition Layer Properties of Plasma Oxidized SiC-SiO2 Stacks | Gernot Fleckl | TU Wien - ISAS |
End Point for Ion Beam Applications | Dr Sebastien Pochon | Oxford Instruments |
Efficient Plasma Cleaning for PECVD | Dr Owain Thomas | Oxford Instruments |
ZnO Optoelectronics using Plasma-based Processing | Borislav Hinkov | FKE und ZMNS, TU Wien |
Diamond Etching – Applications & Challenges | Dr Andrew Newton | Oxford Instruments |
GaN Low Damage Etch by ICP RIE & ALE | Dr Matthew Loveday | Oxford Instruments |
Silicon Etching for Low Loss Integrated Photonics Components | Dr Zhong Ren | Oxford Instruments |
Double-metal Waveguide Fabrication for High Performance THz QCLs | Martin Kainz | u. ZMNS, TU Wien |
Fabrication of Biomedical Devices: An Overview of Relevant Plasma Processing Technology | Dr Harm Knoops |
Oxford Instruments |
Ion Beam Deposition of Nanolayers of VOx & other Materials | Dr Sebastien Pochon |
Oxford Instruments |
Cost Per Person: €240, to include the 2 day seminar and dinner event on 17th of September
You will be sent further joining information after registering.