Meet Oxford Instruments at the CS International Conference in Brussels, Belgium
CS International is one of the leading conferences dedicated to the compound semiconductor industry. The 13th edition of the event will be divided into five key themes focusing on: ultrafast communication, MicroLED, silicon power, VCSEL, and Ultra-wide Bandgap Devices.
Oxford Instruments Plasma Technology team is looking forward to welcoming you to Brussels, Belgium on the 18 - 19 April 2023 to discuss your current projects and workflows. If you would like to book a meeting with us during the event, please complete the form below.
During the CS International Conference, Amandev Singh, Product Manager at Oxford Instruments Plasma Technology, will be giving a talk on the 19th of April, Wednesday, at 2:05 pm (CET) during the "Taking the power from silicon" theme session:
Talk Title: Plasma-Polish Dry Etch: Smoothing solution to prepare Epi-Ready SiC for Power Applications
Silicon Carbide (4H-SiC) is an ideal wide bandgap semiconductor for high-voltage (>1.2kV) power applications, because of its unique material properties. However, with these unique properties come processing challenges, with development required to maintain high yield, and high substrate costs which contribute significantly to device costs. Oxford Instruments has developed and launched their Plasma Polish process, a contactless and scalable smoothing process on their existing PlasmaPro 100 etch platform, to prepare SiC wafers for epi, which addresses yield and cost challenges in SiC device production. During the talk, Amandev will share their progress on the productization of this contactless SiC smoothing process.
Visit the CS International Agenda