Jun
27

AVS ALD/ALE 2021

ALD/ ALE 21st International Conference 2021

Oxford Instruments are sponsors of the AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021).

In collaboration with our application team, Dr Yi Shu, Application Engineer in Oxford Instruments Plasma Technology, will present a set of strategies for high-quality nitride and oxide stacks deposited by ALD in a single run in a single chamber. 

To register or find more information about the event's agenda, please visit the following page: AVS ALD/ALE

Location

Virtual

Date

27-30 June 2021

Business

Plasma Technology